Photochromic YOxHy thin films examined by in situ positron annihilation spectroscopy

Journal Article (2020)
Author(s)

S. W.H. Eijt (TU Delft - Applied Sciences)

T. W.H. De Krom (Student TU Delft)

D. Chaykinab (TU Delft - Applied Sciences)

H. Schut (TU Delft - Applied Sciences)

G. Colombi (TU Delft - Applied Sciences)

S. Cornelius (TU Delft - Applied Sciences)

W. Egger (Universität der Bundeswehr München)

M. Dickmann (Universität der Bundeswehr München)

B. Dam (TU Delft - Applied Sciences)

Research Group
RST/Fundamental Aspects of Materials and Energy
DOI related publication
https://doi.org/10.12693/APhysPolA.137.205 Final published version
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Publication Year
2020
Language
English
Research Group
RST/Fundamental Aspects of Materials and Energy
Issue number
2
Volume number
137
Pages (from-to)
205-208
Downloads counter
316
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Abstract

Doppler broadening positron annihilation spectroscopy depth profiles were collected on photochromic YOxHy thin films. In situ UV illumination of photochromic semiconductor YOxHy films leads to an increase in S-parameter and a large reduction in W-parameter, possibly caused by a change in the charge state of vacancies or the growth of hydrogen-rich metallic Y(Ox)Hy clusters, albeit that vacancy formation or changes in positronium formation during illumination might also play a role. Intriguingly, both the S- and W-parameters increase during thermal bleaching, indicating that another process takes place. The Doppler parameters do not return to their initial values after complete thermal bleaching, suggesting that persistent local rearrangements of vacancies and possibly hydride ions have occurred during the full photodarkening-thermal bleaching cycle. Positron annihilation lifetime spectroscopy shows that a small fraction of positronium is formed in as-deposited YOxHy films, indicating that the films contain some nanopores.

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