Influence of mask induced polarization effects on a pattern printability

Journal article (2005)

Authors

Y Aksenov External organisation
P. Dirksen External organisation
X Wei ImPhys/Optics - AS
P Zandbergen External organisation
Research Group
ImPhys/Optics (AS) (TU Delft)
More Info
expand_more

Published Date

2005

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Optics