Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition

Journal article (2015)

Authors

M. Scotuzzi ImPhys/Charged Particle Optics
M.J. Kamerbeek ImPhys/Charged Particle Optics
A Goodyear External organisation
M Cooke External organisation
C.W. Hagen ImPhys/Charged Particle Optics
Research Group
ImPhys/Charged Particle Optics
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Published Date

2015

Language

Undefined/Unknown

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Research Group

ImPhys/Charged Particle Optics