Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition
Journal Article
(2015)
Author(s)
Marijke Scotuzzi (TU Delft - ImPhys/Charged Particle Optics)
M.J. Kamerbeek (TU Delft - ImPhys/Charged Particle Optics)
A Goodyear (External organisation)
M Cooke (External organisation)
C.W. Hagen (TU Delft - ImPhys/Charged Particle Optics)
Research Group
ImPhys/Charged Particle Optics
DOI related publication
https://doi.org/10.1117/1.JMM.14.3.031206
To reference this document use:
https://resolver.tudelft.nl/uuid:94bbcef0-393f-4d9a-9479-95b68a92aa29
More Info
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Publication Year
2015
Research Group
ImPhys/Charged Particle Optics
Issue number
3
Volume number
14
Pages (from-to)
1-10
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