Melting and crystallization behavior of low-pressure chemical-vapor-deposition amorphous Si films during excimer-laser annealing

Journal article (2004)

Authors

FC Voogt External organisation
R. Ishihara Electronic Components, Technology and Materials - EEMCS
F.D. Tichelaar QN/High Resolution Electron Microscopy
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
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Published Date

2004

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials