Advanced time-multiplexed plasma etching of high aspect ratio silicon structures

Journal Article (2002)

Authors

MA Blauw (TU Delft - QN/Kavli Nanolab Delft)

G Craciun (TU Delft - Electronic Instrumentation)

WG Sloof (OLD Virtual Materials and Mechanics)

PJ French (TU Delft - Electronic Instrumentation)

E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)

Research Group

QN/Kavli Nanolab Delft

Elektrotechniek Techniek Academic journal papers ZX CWTS 1.00 <= JFIS < 3.00

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Publication Year

2002

Research Group

QN/Kavli Nanolab Delft

Issue number

Volume number

Pages (from-to)

3106-3110

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