Advanced time-multiplexed plasma etching of high aspect ratio silicon structures
Journal Article
(2002)
Authors
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
G Craciun (TU Delft - Electronic Instrumentation)
WG Sloof (OLD Virtual Materials and Mechanics)
PJ French (TU Delft - Electronic Instrumentation)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/98af4dd1-d0c3-4391-aeff-551636f62d66
More Info
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Publication Year
2002
Research Group
QN/Kavli Nanolab Delft
Issue number
6
Volume number
20
Pages (from-to)
3106-3110
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