Advanced time-multiplexed plasma etching of high aspect ratio silicon structures

Journal Article (2002)
Authors

MA Blauw (TU Delft - QN/Kavli Nanolab Delft)

G Craciun (TU Delft - Electronic Instrumentation)

WG Sloof (OLD Virtual Materials and Mechanics)

PJ French (TU Delft - Electronic Instrumentation)

E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)

Research Group
QN/Kavli Nanolab Delft
More Info
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Publication Year
2002
Research Group
QN/Kavli Nanolab Delft
Issue number
6
Volume number
20
Pages (from-to)
3106-3110

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