Advanced time-multiplexed plasma etching of high aspect ratio silicon structures
Journal Article
(2002)
Author(s)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
G Craciun (TU Delft - Electronic Instrumentation)
Wim Sloof (TU Delft - OLD Virtual Materials and Mechanics)
Patrick J. French (TU Delft - Electronic Instrumentation)
Emile van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:98af4dd1-d0c3-4391-aeff-551636f62d66
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Publication Year
2002
Research Group
QN/Kavli Nanolab Delft
Issue number
6
Volume number
20
Pages (from-to)
3106-3110
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