Closed loop thermal control of a lithographic optical component
Rudolf Saathof (TU Delft - Mechatronic Systems Design)
A. Haber (TU Delft - Team Michel Verhaegen)
J. W. Spronck (TU Delft - Mechatronic Systems Design)
M. Verhaegen (TU Delft - Team Michel Verhaegen)
R.H. Munnig Schmidt (TU Delft - Mechatronic Systems Design)
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Abstract
In EUV lithography the high throughput and high absorption can cause thermal deformation of the mirrors, which induces image distortion. In a previous paper [1] we have presented an actuation mechanism that is suitable to compensate and correct for these thermal aberrations. In this paper we present a closed-loop control strategy to apply it on this actuation mechanism and its application on an experimental set-up.
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