RM
R.H. Munnig Schmidt
119 records found
1
A demonstrator adaptive optics-system with a thermally actuated active mirror (AM) is presented to pre-study feasibility of sub-nm wavefront control in extreme ultraviolet (EUV) lithography. The AM is thermally actuated by selective heating using a spatial controllable heat sourc
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Due to the absorption of extreme ultraviolet (EUV) light in the projection optical system of an EUV lithography machine, its mirrors thermally deform resulting in wavefront errors (WFEs) that deteriorate the imaging process. In order to compensate and correct for these mirror def
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In EUV lithography, the absorption of EUV light causes wavefront distortion that deteriorates the imaging process. An adaptive optics system has been developed [“Adaptive optics to counteract thermal aberrations,” Ph.D. thesis (TU Delft, 2013)] to correct for this distortion usin
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