Laser ablation threshold of YBa2Cu3O6+x

Journal Article (1994)
Author(s)

B. Dam (Vrije Universiteit Amsterdam)

J. H. Rector (Vrije Universiteit Amsterdam)

M.F. Chang (Vrije Universiteit Amsterdam)

S. Kars (Vrije Universiteit Amsterdam)

D. G. De Groot (Vrije Universiteit Amsterdam)

R. Griessen (Vrije Universiteit Amsterdam)

Affiliation
External organisation
DOI related publication
https://doi.org/10.1063/1.112921
More Info
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Publication Year
1994
Language
English
Affiliation
External organisation
Issue number
12
Volume number
65
Pages (from-to)
1581-1583

Abstract

Using projection optics we made a detailed study of the interaction of a spatially uniform 248 nm excimer laser beam and a 99% dense YBa 2Cu3O6+x target. Below a threshold fluence of 1 J/cm2 the roughness of the irradiated target increases dramatically due to non-stoichiometric ablation. The overall target surface composition becomes increasingly Y rich and Cu poor, while the opposite is found for the corresponding ablated thin films. Above the threshold fluence the composition of the ablated target surface is conserved. As a result of the energy homogeneity of the laser beam obtained by means of projection optics, the optimization of the deposition parameters has been improved leading to the reproducible fabrication of flat, stoichiometric YBa2Cu3O7 films with Tc0's over 91 K.

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