High aspect ratio cyrogenic etching of Silicon with SF6/O2 plasma.
Conference Paper
(2001)
Authors
G Craciun (TU Delft - Electronic Instrumentation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
P. J. French (TU Delft - Electronic Instrumentation)
Research Group
Electronic Instrumentation
To reference this document use:
https://resolver.tudelft.nl/a930cf75-02a3-42b5-bb96-9e0b3420f1b6
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Publication Year
2001
Research Group
Electronic Instrumentation
Pages (from-to)
783-786
ISBN (print)
90-73461-29-4
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