Temperature influence on etching deep holes with SF6/O2 cryogenic plasma.
Conference Paper
(2001)
Author(s)
G Craciun (TU Delft - Electronic Instrumentation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Lina Sarro (TU Delft - Electronic Components, Technology and Materials)
P. J. French (TU Delft - Electronic Instrumentation)
Research Group
Electronic Instrumentation
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https://resolver.tudelft.nl/uuid:ad666bff-bfa2-4744-98ed-0a928b3613c3
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Publication Year
2001
Research Group
Electronic Instrumentation
Pages (from-to)
62-65
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