Limitations and complementary value of cryogenic SF6-O2 and Bosch plasma etch process for silicon micromachining
Conference Paper
(2001)
Author(s)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
G Cracium (External organisation)
P.J. French (TU Delft - Electronic Instrumentation)
Research Group
QN/Kavli Nanolab Delft
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Publication Year
2001
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
89-94
ISBN (print)
0-7923-7012-0
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