Limitations and complementary value of cryogenic SF6-O2 and Bosch plasma etch process for silicon micromachining

Conference Paper (2001)
Author(s)

MA Blauw (TU Delft - QN/Kavli Nanolab Delft)

G Cracium (External organisation)

P.J. French (TU Delft - Electronic Instrumentation)

Research Group
QN/Kavli Nanolab Delft
More Info
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Publication Year
2001
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
89-94
ISBN (print)
0-7923-7012-0

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