Plasma induced charging damage of gate oxides.

Conference paper (1999)

Authors

RG van Veen QN/Kavli Nanolab Delft - AS
A.H. Verbruggen QN/Fysics of NanoElectronics
F Kuper External organisation
MSP Andriesse QN/Kavli Nanolab Delft - AS
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
S Radelaar OLD Metals Processing, Microstructures and Properties
S Anders External organisation
HM Jaeger External organisation
Z Wang Old - sect Separation Technology (DCT/ST)
P Tanner External organisation
C Salm External organisation
T Mouthaan External organisation
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

1999

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft