Plasma induced charging damage of gate oxides.

RG van Veen (TU Delft - QN/Kavli Nanolab Delft)

A.H. Verbruggen (TU Delft - QN/Fysics of NanoElectronics)

E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)

S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)

S Anders (External organisation)

HM Jaeger (External organisation)

Z Wang (TU Delft - Old - sect Separation Technology (DCT/ST))

P Tanner (External organisation)

C Salm (External organisation)

T Mouthaan (External organisation)

F Kuper (External organisation)

MSP Andriesse (TU Delft - QN/Kavli Nanolab Delft)