Microchannel Thermal Management System with Two-Phase Flow for Power Electronics over 500 W/cm2Heat Dissipation

Journal Article (2020)
Author(s)

Fengze Hou (TU Delft - Electronic Components, Technology and Materials, Chinese Academy of Sciences)

Hengyun Zhang (Shanghai University of Engineering Science)

Dezhu Huang (Shanghai University of Engineering Science)

Jiajie Fan (TU Delft - Electronic Components, Technology and Materials)

Fengman Liu (National Center for Advanced Packaging (NCAP China), Chinese Academy of Sciences)

Tingyu Lin (National Center for Advanced Packaging (NCAP China))

Liqiang Cao (National Center for Advanced Packaging (NCAP China), Chinese Academy of Sciences)

Xuejun Fan (Lamar University)

Braham Ferreira (University of Twente)

Guoqi Zhang (TU Delft - Electronic Components, Technology and Materials)

DOI related publication
https://doi.org/10.1109/TPEL.2020.2985117 Final published version
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Publication Year
2020
Language
English
Bibliographical Note
Accepted Auhtor Manuscript
Journal title
IEEE Transactions on Power Electronics
Issue number
10
Volume number
35
Article number
9057466
Pages (from-to)
10592-10600
Downloads counter
481
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Institutional Repository
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Abstract

In this article, a microchannel thermal management system (MTMS) with the two-phase flow using the refrigerant R1234yf with low global warming potential is presented. The thermal test vehicles (TTVs) were made of either single or multiple thermal test chips embedded in the substrates, which were then attached to the MTMS. The system included two identical aluminum microchannel heat sinks (MHSs) connected in series in the cooling loop, which also consisted of a gas flowmeter, a miniature compressor, a condenser, a throttling device, and accessory measurement components. The experimental results showed that the thermal management system could dissipate a heat flux of 526 W/cm2 while maintaining the junction temperature below 120 °C. For SiC mosfet with a higher junction temperature, e.g., 175 °C, the current system is expected to dissipate a heat flux as high as about 750 W/cm2. The effects of the rotational speed of the compressor, the opening of the throttling device, TTV layout on MHS, and a downstream heater on the cooling performance of the system were analyzed in detail. The study shows that the present thermal management with a two-phase flow system is a promising cooling technology for the high heat flux SiC devices.

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