Ultra-high depth resolution RBS and SIMS of the modification of a Ge delta in Si during 2 keV O2+ sputtering

Journal article (1998)

Authors

WM Arnoldbik External organisation
ZX Jiang External organisation
P.F.A. Alkemade Old - sect Electronic Materials (NS/EM)
DJ Boerma External organisation
Research Group
Old - sect Electronic Materials (NS/EM)
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Published Date

1998

Language

Undefined/Unknown

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Research Group

Old - sect Electronic Materials (NS/EM)