Ultra-high depth resolution RBS and SIMS of the modification of a Ge delta in Si during 2 keV O2+ sputtering

Journal Article (1998)
Author(s)

WM Arnoldbik (External organisation)

ZX Jiang (External organisation)

PFA Alkemade (TU Delft - Old - sect Electronic Materials (NS/EM))

DJ Boerma (External organisation)

Research Group
Old - sect Electronic Materials (NS/EM)
More Info
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Publication Year
1998
Research Group
Old - sect Electronic Materials (NS/EM)
Issue number
1
Volume number
136-138
Pages (from-to)
540-544

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