Ultra-high depth resolution RBS and SIMS of the modification of a Ge delta in Si during 2 keV O2+ sputtering
Journal Article
(1998)
Author(s)
WM Arnoldbik (External organisation)
ZX Jiang (External organisation)
PFA Alkemade (TU Delft - Old - sect Electronic Materials (NS/EM))
DJ Boerma (External organisation)
Research Group
Old - sect Electronic Materials (NS/EM)
To reference this document use:
https://resolver.tudelft.nl/uuid:beac6244-1d4c-4ade-b686-af11c22d76eb
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Publication Year
1998
Research Group
Old - sect Electronic Materials (NS/EM)
Issue number
1
Volume number
136-138
Pages (from-to)
540-544
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