A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces

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A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces

Journal Article (2015)

Author(s)

Rui Liu (California Institute of Technology)

Lihao Han (California Institute of Technology, TU Delft - Photovoltaic Materials and Devices)

Zhuangqun Huang (California Institute of Technology)

Ivonne M. Ferrer (California Institute of Technology)

Arno Smets (TU Delft - Photovoltaic Materials and Devices)

Miro Zeman (TU Delft - Electrical Sustainable Energy)

Bruce S. Brunschwig (California Institute of Technology)

Nathan S. Lewis (California Institute of Technology)

Research Group

Photovoltaic Materials and Devices

DOI related publication

https://doi.org/10.1016/j.tsf.2015.04.018

Nanoparticles Hydrogen evolution Atomic layer deposition Thin films Water splitting Platinum

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Publication Year

2015

Language

English

Research Group

Photovoltaic Materials and Devices

Volume number

586

Pages (from-to)

28-34

Abstract

Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.

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