A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces

Journal Article (2015)
Author(s)

Rui Liu (California Institute of Technology)

Lihao Han (California Institute of Technology, TU Delft - Electrical Engineering, Mathematics and Computer Science)

Zhuangqun Huang (California Institute of Technology)

Ivonne M. Ferrer (California Institute of Technology)

Arno Smets (TU Delft - Electrical Engineering, Mathematics and Computer Science)

Miro Zeman (TU Delft - Electrical Engineering, Mathematics and Computer Science)

Bruce S. Brunschwig (California Institute of Technology)

Nathan S. Lewis (California Institute of Technology)

Research Group
Photovoltaic Materials and Devices
DOI related publication
https://doi.org/10.1016/j.tsf.2015.04.018 Final published version
More Info
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Publication Year
2015
Language
English
Research Group
Photovoltaic Materials and Devices
Volume number
586
Pages (from-to)
28-34
Downloads counter
197

Abstract

Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.