Modeling Valance Change Memristor Device

Oxide Thickness, Material Type, and Temperature Effects

Journal Article (2016)
Author(s)

Heba Abunahla (Khalifa University)

Baker Mohammad (Khalifa University)

Dirar Homouz (Khalifa University)

Curtis J. Okelly (Khalifa University)

Affiliation
External organisation
DOI related publication
https://doi.org/10.1109/TCSI.2016.2622225
More Info
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Publication Year
2016
Language
English
Affiliation
External organisation
Issue number
12
Volume number
63
Pages (from-to)
2139-2148

Abstract

This paper presents a physics-based mathematical model for anionic memristor devices. The model utilizes Poisson-Boltzmann equation to account for temperature effect on device potential at equilibrium and comprehends material effect on device behaviors. A detailed MATLAB based algorithm is developed to clarify and simplify the simulation environment. Moreover, the provided model is used to simulate and predict the effect of oxide thickness, material type, and operating temperatures on the electrical characteristics of the device. The parameters of the proposed model are tuned and validated using experimental data of a fabricated wire based NbO1-x junction. This device is attractive for neuromorphic and computing applications, where multilevel state is desirable. The value of this contribution is to provide a framework intended to simulate anionic memristor devices using correlated mathematical models. In addition, the model can be used to explore device materials and predict its performance.

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