Vertically tapered layers for optical applications fabricated using resist reflow
Journal Article
(2009)
Author(s)
A. Emadi (TU Delft - Electronic Instrumentation)
HW Wu (TU Delft - Electronic Instrumentation)
S Grabarnik (TU Delft - Electronic Instrumentation)
G De Graaf (TU Delft - Electronic Instrumentation)
Reinoud F. Wolfenbuttel (TU Delft - Electronic Instrumentation)
Research Group
Electronic Instrumentation
To reference this document use:
https://resolver.tudelft.nl/uuid:d8b733ad-7105-48ba-9654-821002d042c1
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Publication Year
2009
Research Group
Electronic Instrumentation
Volume number
19
Pages (from-to)
074014(1)-074014(9)
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