Influence of HSQ resist exposure temperature on ultra-high resolution electron beam lithography
Journal Article
(2008)
Author(s)
VA Sidorkin (TU Delft - QN/Kavli Nanolab Delft)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Huub Salemink (TU Delft - QN/Photronic Devices)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:d9451889-88e7-4562-905b-9b404a2d13d5
More Info
expand_more
expand_more
Publication Year
2008
Research Group
QN/Kavli Nanolab Delft
Volume number
26
Pages (from-to)
2049-2053
No files available
Metadata only record. There are no files for this record.