A quantitative evaluation of pattern transfer across (111) surfaces in a (100) silicon wafer by contact masking and over-exposure
Conference Paper
(2004)
Author(s)
W.J. Venstra (TU Delft - Mechatronic Systems Design)
M Laros (TU Delft - Electronic Components, Technology and Materials)
J.W. Spronck (TU Delft - Mechatronic Systems Design)
Pasqualina Maria Sarro (TU Delft - Electronic Components, Technology and Materials)
J. Eijk (External organisation)
Research Group
Mechatronic Systems Design
To reference this document use:
https://resolver.tudelft.nl/uuid:de8f9c3e-88ba-4866-9f32-b39c95cc8ebe
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Publication Year
2004
Research Group
Mechatronic Systems Design
Pages (from-to)
313-316
ISBN (print)
88-7621-282-5
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