Novel microelectrode arrays for in-vitro analysis of neural activity
Y.S.R. Vyza (TU Delft - Electrical Engineering, Mathematics and Computer Science)
V. Valente – Mentor (TU Delft - Bio-Electronics)
Aline Renz – Mentor (ETH Zürich)
Sean Weaver – Mentor (ETH Zürich)
Janos Voros – Mentor (ETH Zürich)
W.A. Serdijn – Graduation committee member (TU Delft - Bio-Electronics)
Ronald Dekker – Coach
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Abstract
Microelectrode arrays (MEAs) are extensively used for measuring neural activity in-vitro given their ability to monitor several neurons simultaneously unlike techniques such as patch clamp. However, MEAs still have limitations in acquiring high spatial resolution data due to limited number of channels that can be parallelly scanned, the need for bulky anti-aliasing filters, and limitations in signal-to-noise ratio (SNR) arising from thermal noise. Commercially available MEAs rely on resistive or self-capacitive sensing scheme, but this research proposes a new approach to increase the number of sensing locations while reducing the channels and to increase SNR. Fundamental design aspects of a MEA such as the shape and size of electrodes are revisited. By employing traditional lithographic fabrication techniques, these arrays with various geometries are fabricated and characterized. Neural cultures are seeded on these novel MEAs to record neural activity in the electrical domain and concurrently Ca+2 Imaging is performed to correlate and verify the activity of a neuron.