Kinetics of Cu segregation in AlCu (1%) submicron interconnects studied by resistance measurements
Conference Paper
(1997)
Author(s)
AJ Kalkman (TU Delft - QN/Fysics of NanoElectronics)
Guido Janssen (TU Delft - OLD Metals Processing, Microstructures and Properties)
A.H. Verbruggen (TU Delft - QN/Fysics of NanoElectronics)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
QN/Fysics of NanoElectronics
To reference this document use:
https://resolver.tudelft.nl/uuid:e2e41148-ebff-4ff0-9915-e906d449bf10
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Publication Year
1997
Research Group
QN/Fysics of NanoElectronics
Pages (from-to)
267-272
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