Multiprobe resistance monitoring of Blech pattern during electromigration testing.

Conference paper (1999)

Authors

S Shingubara External organisation
T Osaka External organisation
H Sakaue External organisation
T Takahagi External organisation
A.H. Verbruggen QN/Fysics of NanoElectronics
Research Group
QN/Fysics of NanoElectronics
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Published Date

1999

Language

Undefined/Unknown

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Research Group

QN/Fysics of NanoElectronics