High-temperature tensile tests and activation volume measurement of free-standing submicron Al films
Journal Article
(2002)
Author(s)
AJ Kalkman (TU Delft - QN/Fysics of NanoElectronics)
AH Verbruggen (TU Delft - QN/Fysics of NanoElectronics)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
QN/Fysics of NanoElectronics
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https://resolver.tudelft.nl/uuid:f3d0405b-07d7-419e-a20f-1f8801863e6f
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Publication Year
2002
Research Group
QN/Fysics of NanoElectronics
Issue number
11
Volume number
92
Pages (from-to)
6612-6615
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