Electrical characteristics of plasma-enhanced chemical vapor deposited silicon carbide thin films

Journal article (2003)

Authors

HTM Pham Electronic Components, Technology and Materials - EEMCS
T Akkaya Electronic Components, Technology and Materials - EEMCS
C.R. de Boer Electronic Components, Technology and Materials - EEMCS
Pasqualina M Sarro Electronic Components, Technology and Materials - EEMCS
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
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Published Date

2003

Language

Undefined/Unknown

Reuse Rights

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials