Limitations and complementary value of cryogenic SF6-O2 and Bosch plasma etch process for silicon micromachining.
Conference Paper
(2001)
Author(s)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
G Craciun (TU Delft - Electronic Instrumentation)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
P.J. French (TU Delft - Electronic Instrumentation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:fdd9c781-eb5d-4547-9677-b6e973a1969b
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Publication Year
2001
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
89-94
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