Resist assisted patterning

Abstract

Helium ion beam lithography (HIL) has been demonstrated as a promising alternative to electron beam lithography (EBL) for R&D purposes, offering high-resolution lithography at high pattern densities. This chapter reviews focused He ion beam lithography, providing a detailed discussion on the ion beam-resist interaction mechanisms and latest experimental results in this field. In addition, impact of ion shot noise is examined, a comparison to He-ion beam milling is made, and future directions are mentioned.