Print Email Facebook Twitter Electron-Irradiation-Induced Degradation of Transfer Characteristics in Super-Junction VDMOSFET Title Electron-Irradiation-Induced Degradation of Transfer Characteristics in Super-Junction VDMOSFET Author Jiang, Jing (Fudan University) Wang, S. (TU Delft Bio-Electronics; Southern University of Science and Technology) Liu, X. (TU Delft Interactive Intelligence; Southern University of Science and Technology) Liu, Jianhui (Sky Chip Interconnection Technology Co) Li, Jun (Sky Chip Interconnection Technology Co) Zhou, Dexiang (Sky Chip Interconnection Technology Co) Zhang, Kouchi (TU Delft Electronic Components, Technology and Materials) Ye, H. (TU Delft Electronic Components, Technology and Materials; Southern University of Science and Technology; Chongqing University) Tan, C. (TU Delft Electronic Components, Technology and Materials; Chongqing University) Date 2022 Abstract High electric-field stress is an effective solution to the recovery of irradiated devices. In this paper, the dependence of the recovery level on the magnitude of gate voltage and duration is investigated. Compared with the scheme of high gate-bias voltage with a short stress time, the transfer characteristics are significantly recovered by applying a low electric field with a long duration. When the electric field and stress time are up to a certain value, the threshold voltage almost approaches the limitation, which is less than that before irradiation. Meanwhile, the effect of temperature on the recovery of the irradiated devices is also demonstrated. The result indicates that a high temperature of 175 °C used for the irradiated devices’ annealing does not play a role in promoting the recovery of transfer characteristics. In addition, to obtain a deep-level understanding of threshold degradation, the first-principles calculations of three Si/SiO2 interfaces are performed. It is found that new electronic states can be clearly observed in the conduction bans and valence bands after the Si-H/-OH bonds are broken by electron irradiation. However, their distribution depends on the selection of the passivation scheme. Ultimately, it can be observed that the threshold voltage linearly decreases with the increase in interface charge density. These results can provide helpful guidance in the deep interpretation of threshold degradation and the recovery of the irradiated super-junction devices. Subject electron irradiationtransfer characteristicsdegradationSi/SiO2 interfacefirst-principles calculationinterface charge densitythreshold variation To reference this document use: http://resolver.tudelft.nl/uuid:5e5022f8-2ee1-4803-9716-37d0ca5c399a DOI 10.3390/ electronics11132076 ISSN 2079-9292 Source Electronics (Switzerland), 11 (13) Part of collection Institutional Repository Document type journal article Rights © 2022 Jing Jiang, S. Wang, X. Liu, Jianhui Liu, Jun Li, Dexiang Zhou, Kouchi Zhang, H. Ye, C. Tan Files PDF electronics_11_02076.pdf 2.07 MB Close viewer /islandora/object/uuid:5e5022f8-2ee1-4803-9716-37d0ca5c399a/datastream/OBJ/view