Lutetium coating of nanoparticles by atomic layer deposition

Lutetium coating of nanoparticles by atomic layer deposition

Moret, J.L.T.M. (TU Delft RID/KEWO/Stralingsbeschermingseenheid; TU Delft ChemE/Product and Process Engineering)
Griffiths, Matthew B.E. (Carleton University)
Frijns, Jeannine E.B.M. (Student TU Delft)
Terpstra, B.E. (TU Delft RST/Technici Pool)
Wolterbeek, H.T. (TU Delft RST/Applied Radiation & Isotopes)
Barry, Seán T. (Carleton University)
Denkova, A.G. (TU Delft RST/Applied Radiation & Isotopes)
van Ommen, J.R. (TU Delft ChemE/Product and Process Engineering)

2020

Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO₂ nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)₃ and the custom-made Lu(HMDS)₃. Using Lu(TMHD)₃, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)₃, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.

http://resolver.tudelft.nl/uuid:76fc3da0-954e-49a5-82c3-3aecfa4cb3ed

https://doi.org/10.1116/1.5134446

2021-02-21

0734-2101

Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films, 38 (2)

Accepted Author Manuscript

Institutional Repository

journal article

© 2020 J.L.T.M. Moret, Matthew B.E. Griffiths, Jeannine E.B.M. Frijns, B.E. Terpstra, H.T. Wolterbeek, Seán T. Barry, A.G. Denkova, J.R. van Ommen