A transfer-free wafer-scale CVD graphene fabrication process for MEMS/NEMS sensors

A transfer-free wafer-scale CVD graphene fabrication process for MEMS/NEMS sensors

Vollebregt, S. (TU Delft Electronic Components, Technology and Materials)
Alfano, B. (ENEA UTTP-MDB; Università degli Studi di Napoli Federico II)
Ricciardella, F. (Italian Institute of Technology)
Giesbers, A.J.M. (Philips Innovation Services)
Hagendoorn, Y. (TU Delft Electronic Components, Technology and Materials)
van Zeijl, H.W. (TU Delft EKL Processing)
Polichetti, T (ENEA UTTP-MDB)
Sarro, Pasqualina M (TU Delft Electronic Components, Technology and Materials)

2016-01

In this paper we report a novel transfer-free graphene fabrication process, which does not damage the graphene layer. Uniform graphene layers on 4" silicon wafers were deposited by chemical vapor deposition using the CMOS compatible Mo catalyst. Removal of the Mo layer after graphene deposition results in a transfer-free and controlled placement of the graphene on the underlying SiO2. Moreover, pre-patterning the Mo layer allows customizable graphene geometries to be directly obtained, something that has never been achieved before. This process is extremely suitable for the large-scale fabrication of MEMS/NEMS sensors, especially those benefitting from specific properties of graphene, such as gas sensing.

Silicon
Graphene
Substrates
Micromechanical devices
Fabrication
Wet etching
Electrodes

http://resolver.tudelft.nl/uuid:e9e19132-719d-4445-b861-a56ab8aebe7c

https://doi.org/10.1109/MEMSYS.2016.7421546

IEEE, Piscataway, NJ

978-1-5090-1973-1

2016 IEEE 29th International Conference on Micro Electro Mechanical Systems (MEMS)

MEMS 2016, 2016-01-24 → 2016-01-28, Shanghai, China

Institutional Repository

conference paper

© 2016 S. Vollebregt, B. Alfano, F. Ricciardella, A.J.M. Giesbers, Y. Hagendoorn, H.W. van Zeijl, T Polichetti, Pasqualina M Sarro