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- A kinetic study of titanium nitride chemical vapor deposition using nitrogen, hydrogen, and titanium tetrachloride
- Chemical vapor deposition of titanium diboride using boron tribromide, titanium tetrachloride, and hydrogen
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Kinetics of tungsten low-pressure chemical-vapor deposition using WF
6 and SiH 4 studied by in situ growth-rate measurements
- Kinetics and mechanism of tungsten LPCVD using tungsten hexafluoride and silane studied by in-situ growth rate measurements
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