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Botsuioruto, F. (author), Van Turnhout, M. (author), Marinescu, O.E. (author)
PROBLEM TO BE SOLVED: To provide a method of designing a projection system for a lithography projection apparatus, to provide a lithography apparatus comprising the projection system, and to provide a method for manufacturing a device by using the projection system. ; SOLUTION: In the first place, local optimization of the projection system is...
patent 2007