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- Paauw, A.R. (author), Wei, Z.G. (author), Wieringa, P.A. (author) conference paper 1996
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- Wei, Z.G. (author), Paauw, A.R. (author), Wieringa, P.A. (author) conference paper 1996
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- Wei, Z.G. (author), Wieringa, P.A. (author) conference paper 1997
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- Wei, Zhi-Gang (author) doctoral thesis 1998
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Kirby, J.T. (author), Wei, G. (author), Chen, Q. (author), Kennedy, A.B. (author), Dalrymple, R.A. (author)This report documents the computer program FUNWAVE based on the fully nonlinear Boussinesq model of Wei et al. (1995). The documentation provides a description of the governing equations and the numerical scheme used to solve it. A user's manual is provided and gives instructions on how to use various preprocessors and postprocessors to set up...report 1998
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Gunadi, A. (author), Nguyen, H.T. (author), Li, X.N. (author), Wei, W. (author)Document(en) uit de collectie Chemische Procestechnologiereport 2001
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Wei, C. (author)The periodic shifting of the bifurcation point of the North Channel and South Channel of the Yangtze river is very important in the estuary. The North Channel is bifurcated from the South Branch by cutting a channel through the submerged sandbanks. Once a bifurcation channel is formed, the differences in flow conditions of the two waterways make...report 2002
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Wei, X. (author), Urbach, H.P. (author), Wachters, A. (author), Aksenov, Y. (author)The polarization induced by the mask is studied by using a 3D rigorous model, wich solves Maxwell equations using the finite element method. Teh aerial image depends strongly on the change of polarization induced by the materials, thickness of the layer and pitch of the periodic masks.conference paper 2005
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Wei, X. (author)We present a three-dimensional model based on the finite element method for solving the time-harmonic Maxwell equation in optics. It applies to isotropic or anisotropic dielectrics and metals, and to many configurations such as an isolated scatterer in a multilayer, bi-gratings and crystals. We shall discuss the applications of the model to high...doctoral thesis 2006
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- Duc, T.C. (author), Wei, J. (author), Sarro, P.M. (author), Lau, G.K. (author) conference paper 2007
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- Duc, T.C. (author), Wei, J. (author), Sarro, P.M. (author), Lau, G.K. (author) conference paper 2007
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Wei, X. (author), Wachters, A.J.H. (author), Urbach, H.P. (author)We present a three-dimensional model based on the finite-element method for solving the time harmonic Maxwell equation in optics. It applies to isotropic or anisotropic dielectrics and metals and to many configurations such as an isolated scatterer in a multilayer, bi-gratings, and crystals. We discuss the application of the model to near-field...journal article 2007
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- Wei, Shi (author) journal article 2008
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Wei, H. (author), Nazarov, Y.V. (author)We address continuous weak linear quantum measurement and argue that it is best understood in terms of statistics of the outcomes of the linear detectors measuring a quantum system, for example, a qubit. We mostly concentrate on a setup consisting of a qubit and three independent detectors that simultaneously monitor three noncommuting operator...journal article 2008
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- Wei, W. (author) doctoral thesis 2008
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- Wei, Shi (author) conference paper 2009
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- Wei, Y. (author) conference paper 2009
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Verhaar, T.M. (author), Wei, J. (author), Sarro, P.M. (author)In this paper, a process to realize metal lines on the sidewall of high aspect ratio cavities is developed. As an alternative to conventional photoresist, SU8 is used to define patterns on vertical sidewalls of deep cavities while maintaining compatibility with conventional IC processes. When transferring a pattern onto a 3D structure,...journal article 2009
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- Wei, Y. (author) conference paper 2010
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Wei, J. (author), Chen, Z.L. (author), Liu, Z.W. (author), Sarro, P.M. (author)This paper presents a silicon MEMS capacitive structure to investigate a test methodology for fF-level capacitive sensors’ measurement. The device mimics a capacitive sensor with a changing intermediate layer between the electrodes. A single mask bulk micromachining process is used to fabricate the device, which has a nominal capacitance of 1.2...journal article 2010