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Wu, H. (author), Emadi, A. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)A thermopile-based detector array for use in a miniaturized Infrared (IR) spectrometer has been designed and fabricated using CMOS compatible MEMS technology. The emphasis is on the optimal of the detector array at the system level, while considering the thermal design, the dimensional constraints of a design on a chip and the CMOS compatibility...conference paper 2010
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Emadi, A. (author), Grabarnik, S. (author), Wu, H. (author), De Graaf, G. (author), Hedsten, K. (author), Enoksson, P. (author), Correia, J.H. (author), Wolffenbuttel, R.F. (author)This paper reports on the functional and spectral characterization of a microspectrometer based on a CMOS detector array covered by an IC-Compatible Linear Variable Optical Filter (LVOF). The Fabry-Perot LVOF is composed of 15 dielectric layers with a tapered middle cavity layer, which has been fabricated in an IC-Compatible process using resist...conference paper 2010
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Wu, H. (author), Emadi, A. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)The miniaturized IR spectrometer discussed in this paper is comprised of: slit, planar imaging diffraction grating and Thermo-Electric (TE) detector array, which is fabricated using CMOS compatible MEMS technology. The resolving power is maximized by spacing the TE elements at an as narrow as possible pitch, which is limited by processing...conference paper 2010
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Emadi, A. (author), Wu, H. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)This paper reports on a CMOS-Compatible Linear Variable Optical Filter (LVOF) visible micro-spectrometer. The CMOS-compatible post process for fabrication of the LVOF has been used for integration of the LVOF with a CMOS chip containing a 128-element photodiode array and readout circuitry. Fabrication of LVOF involves a process for fabrication...conference paper 2010
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Wu, H. (author), Grabarnik, S. (author), Emadi, A. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)The spectral resolution of a MEMS-based IR microspectrometer critically depends on the thermal cross-talk between adjacent TE elements in the detector array. Thermal isolation between elements is realized by using bulk micromachining directly following CMOS processing. This paper reports on the characterization results of bridge-shaped TE...journal article 2009
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Mol, L. (author), Rocha, L.A. (author), Cretu, E. (author), Wolffenbuttel, R.F. (author)This paper provides experimental validation of the predictions by two recent models for squeezed film damping in the free molecule regime. Measurements were carried out using a parallel-plate microstructure with a 2.29 ?m gap operated at pressures from 105 to 101 Pa (corresponding to Knudsen numbers from 0.03 to 300). Experiments are in good...journal article 2009
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Mol, L. (author), Rocha, L.A. (author), Cretu, E. (author), Wolffenbuttel, R.F. (author)Squeeze-film damping is highly inadequate in low-pressure systems or in systems where air pressure and/or gap dimensions are poorly defined. Input shaping has been used to circumvent the oscillations typically associated with under-damped mass-spring-damper systems and drastically decrease the settling time. The proposed method does not rely on...journal article 2009
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Emadi, A. (author), Wu, H. (author), Grabarnik, S. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)This paper reports on the IC-compatible fabrication of vertically tapered optical layers for use in linear variable optical filters (LVOF). The taper angle is fully defined by a mask design. Only one masked lithography step is required for defining strips in a photoresist with trenches etched therein of a density varying along the length of the...journal article 2009
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- Wolffenbuttel, R.F. (author), De Graaf, G. (author), Leijtens, J.A.P. (author) patent 2009
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Rocha, L.A. (author), Mol, L. (author), Cretu, E. (author), Wolffenbuttel, R.F. (author), Machado da Silva, J. (author)A test technique for capacitive MEMS accelerometers and electrostatic microactuators, based on the measurement of pull-in voltages and resonance frequency, is described. Using this combination of measurements, one can estimate process-induced variations in the device layout dimensions as well as deviations from nominal value in material...journal article 2008
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Grabarnik, S. (author), Emadi, A. (author), Wu, H. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)A concept for a highly miniaturized spectrometer featuring a two-component design is presented. The first component is a planar chip that integrates an input slit and aberration-correcting diffraction grating with an image sensor and is fabricated using microelectromechanical systems (MEMS) technologies. Due to the fabrication in a simple MEMS...journal article 2008
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Grabarnik, S. (author), Emadi, A. (author), Wu, H. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)This paper reports on the development and validation of a new technology for the fabrication of variable line-spacing non-planar diffraction gratings to be used in compact spectrometers. The technique is based on the standard lithographic process commonly used for pattern transfer onto a flat substrate. The essence of the technology presented...conference paper 2008
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- Grabarnik, S. (author), Emadi, A. (author), Wu, H. (author), De Graaf, G. (author), Vdovin, G. (author), Wolffenbuttel, R.F. (author) journal article 2008
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Grabarnik, S. (author), Emadi, A. (author), Sokolova, E. (author), Vdovin, G. (author), Wolffenbuttel, R.F. (author)An analytical model has been developed and applied to explore the limits in the design of a highly miniaturized planar optical microspectrometer based on an imaging diffraction grating. This design tool has been validated as providing the smallest possible dimensions while maintaining acceptable spectral resolution. The resulting planar...journal article 2008
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- Wu, H. (author), Grabarnik, S. (author), Emadi, A. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author) journal article 2008
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- Mol, L. (author), Rocha, L.A. (author), Cretu, E. (author), Wolffenbuttel, R.F. (author) journal article 2008
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Correia, J.H. (author), Emadi, A.R. (author), Wolffenbuttel, R.F. (author)This paper describes the design and modeling of a UV bandpass optical filter for microspectrometers. The materials used for fabricating the multilayer UV filter are: silicon dioxide (SiO2), titanium dioxide (TiO2) and yttrium oxide (Y2O3). The optical filter shows a bandpass response wavelength in the range 230-280 nm, with a transmittance...journal article 2006
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- Minas, G. (author), Wolffenbuttel, R.F. (author), Correia, J.H. (author) journal article 2006
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- Rocha, L.A. (author), Cretu, E. (author), Wolffenbuttel, R.F. (author) journal article 2006
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- De Graaf, G. (author), Mol, L. (author), Rocha, L.A. (author), Cretu, E. (author), Wolffenbuttel, R.F. (author) journal article 2005