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Searched for: department%3A%22Electrical%255C%252BSustainable%255C%252BEnergy%22
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Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution
Hydrogenated amorphous silicon deposited under accurately controlled ion bombardment using pulse-shaped substrate biasing
On the surface roughness development of hydrogenated amorphous silicon deposited at low growth rates