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Scotuzzi, M. (author), Kamerbeek, M.J. (author), Goodyear, A. (author), Cooke, M. (author), Hagen, C.W. (author)To demonstrate the possibility of using electron beam-induced deposition (EBID) masks for sub-10 nm pattern transfer into silicon, first experiments were carried out by using 20- to 40-nm EBID masks, which were etched by different chemistries. It is experimentally verified that recipes based on hydrogen bromide, chlorine, and boron trichloride...journal article 2015