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Nanofabrication with a helium ion microscope
Nanofabrication with a helium ion microscope
Nanofabrication with a High Resolution Helium Ion Beam
Nanofabrication with a High Resolution Helium Ion Beam
Compact Mach-Zehnder interferometer based on self-collimation of light in a silicon photonic crystal
Compact Mach-Zehnder interferometer based on self-collimation of light in a silicon photonic crystal
Photonic crystal Mach-Zehnder interferometer operating in the self-collimation mode of light
Photonic crystal Mach-Zehnder interferometer operating in the self-collimation mode of light
Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist
Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist
Wavelength-sized cavities in high aspect InP/InGaAsP/InP photonic crystals
Wavelength-sized cavities in high aspect InP/InGaAsP/InP photonic crystals
Sub-10-nm nanolithography with a scanning helium beam
Sub-10-nm nanolithography with a scanning helium beam
Wavelength-sized, tunable nanocavity in deeply etched InP/InGaAsP/InP photonic crystals
Wavelength-sized, tunable nanocavity in deeply etched InP/InGaAsP/InP photonic crystals
Nanofabrication with a helium ion microscope
Nanofabrication with a helium ion microscope
Size-dependent effective Young’s modulus of silicon nitride cantilevers
Size-dependent effective Young’s modulus of silicon nitride cantilevers
Tuning of narrow-bandwidth photonic crystal devices etched in InGaAsP planar waveguides by Liquid Crystal infiltration
Tuning of narrow-bandwidth photonic crystal devices etched in InGaAsP planar waveguides by Liquid Crystal infiltration
Effect of undercut on the resonant behaviour of silicon nitride cantilevers
Effect of undercut on the resonant behaviour of silicon nitride cantilevers
Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography
Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography
Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
Transmission measurement of the photonic band gap of GaN photonic crystal slabs
Transmission measurement of the photonic band gap of GaN photonic crystal slabs
Asymmetry reversal and waveguide modes in photonic crystal slabs
Asymmetry reversal and waveguide modes in photonic crystal slabs
High-dose exposure of silicon in electron beam lithography
High-dose exposure of silicon in electron beam lithography
InP-based planar photonic crystals infiltrated with solid polymers and liquid crystals
InP-based planar photonic crystals infiltrated with solid polymers and liquid crystals
2D InP photonic crystal fabrication process development
2D InP photonic crystal fabrication process development
Two-dimensional photonic crystals from semiconductor material with polymer filled holes
Two-dimensional photonic crystals from semiconductor material with polymer filled holes
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