Design of large-area metasurfaces for the mid-IR and suited for CMOS-compatible fabrication by masked lithography

The use of masked UV (i-line) lithography in a MEMS foundry for CMOS-compatible fabrication of large-area metasurface-based absorbers for the mid-infrared is demonstrated. The challenges are in: (a) the limited number of acceptable metals, (b) the thickness tolerance of the layers used in the CMOS process, and (c) the imaging capabilities of...

Maintaining transparency of a heated MEMs membrane for enabling long-term optical measurements on soot-containing exhaust gas

Ensuring optical transparency over a wide spectral range of a window with a view into the tailpipe of the combustion engine, while it is exposed to the harsh environment of sootcontaining exhaust gas, is an essential pre-requisite for introducing optical techniques for long-term monitoring of automotive emissions. Therefore, a regenerable...