Searched for: subject%3A%22Scatterometry%22
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Dou, X. (author)
In the semiconductor industry, the minimumelement size has stepped into nanometer level. To keep the functionality of fabricated nanostructures, there is a huge demand of a technique that can provide non-destructive inspection and allow for in-line or in-situ monitoring during the manufacturing process. Optical scatterometry, which uses the far...
doctoral thesis 2024
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auf der Heiden, F.K. (author), Münzer, Oliver (author), Van Staalduine, Simon (author), Amunts, Katrin (author), Axer, Markus (author), Menzel, Miriam (author)
We propose the application of Compressed Sensing to Computational Scattered Light Imaging to decrease measurement time and data storage. Computational Scattered Light Imaging (ComSLI) determines three-dimensional fiber orientations and crossings in biomedical tissues like brain tissue. Currently, conventional ComSLI is time-consuming and...
conference paper 2024
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Paul, A. (author), Rafigh Doost, J. (author), Dou, X. (author), Pereira, S.F. (author)
Nanostructures with steep side wall angles (swa) play a pivotal role in various technological applications. Accurate characterization of these nanostructures is crucial for optimizing their performance. In this study, we propose a far-field detection method based on coherent Fourier scatterometry (CFS) for accurate quantification of steep swa...
journal article 2024
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Soman, S. (author), Horsten, R.C. (author), Scholte, T.C. (author), Pereira, S.F. (author)
Inspection of surface and nanostructure imperfections play an important role in high-throughput manufacturing across various industries. This paper introduces a novel, parallelised version of the metrology and inspection technique: Coherent Fourier scatterometry (CFS). The proposed strategy employs parallelisation with multiple probes,...
journal article 2024
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Koppert, Reint (author)
Scatterometry is a non-destructive metrology technique widely used in the semiconductor industry for the reconstruction of periodic structures from diffraction measurements. This involves solving a so-called inverse problem, which can be done by tuning the geometry parameters of a forward model such that the discrepancy between the measured...
student report 2023
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Rafigh Doost, J. (author), Kolenov, D. (author), Pereira, S.F. (author)
It has been a widely growing interest in using silicon carbide (SiC) in high-power electronic devices. Yet, SiC wafers may contain killer defects that could reduce fabrication yield and make the device fall into unexpected failures. To prevent these failures from happening, it is very important to develop inspection tools that can detect,...
journal article 2023
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Kolenov, D. (author), Pereira, S.F. (author)
For the development of integrated circuits, the accompanying metrology inside the fabrication process is essential. Non-imaging metrology of nanostructure has to be quick and non-destructive. The multilayers are crucial components of today's microprocessor nanostructures and reflective coatings. Coherent Fourier scatterometry (CFS), which is...
conference paper 2023
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Kolenov, D. (author)
The phenomenon of scattering is ubiquitous. The human eye sees it as a ``blue" sky in a summer morning or a diffuse glow during the night, the color of a laser or fog in the air. Alternatively, scattering recorded with a state-of-the-art instrument manifests itself in collisions between atoms, electrons, and photons, such as processes in nuclear...
doctoral thesis 2022
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Yin, Haoyang (author)
As demand for chips increases and critical dimension keeps shrinking, the inspection of wafer becomes one of the critical challenges in the high volume production of chips. Coherent Fourier scatterometry (CFS) is a scanning bright field technique that is capable to detect nanoparticles on Si surfaces. The optical readout of CFS consists of a two...
master thesis 2022
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Ansuinelli, P. (author)
The importance of inverse problems is paramount in science and physics because their solution provides information about parameters that cannot be directly observed. This thesis discusses and details the application of a few inverse methods in optical imaging, metrology and inspection of lithographic targets, particularly patterned structures on...
doctoral thesis 2022
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Soman, S. (author), Pereira, S.F. (author), El Gawhary, O. (author)
In recent years, a lot of works have been published that use parameter retrieval using orbital angular momentum (OAM) beams. Most make use of the OAM of different Laguerre-Gauss modes. However, those specific optical beams are paraxial beams and this limits the regime in which they can be used. In this paper, we report on the first results on...
journal article 2022
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Shan, X. (author), Steele-Dunne, S.C. (author), Huber, M. (author), Hahn, Sebastian (author), Wagner, Wolfgang (author), Bonan, Bertrand (author), Albergel, Clement (author), Calvet, Jean-Christophe (author), Ku, Ou (author), Georgievska, Sonja (author)
A Deep Neural Network (DNN) is used to estimate the Advanced Scatterometer (ASCAT) C-band microwave normalized backscatter (σ40o), slope (σ′) and curvature (σ″) over France. The Interactions between Soil, Biosphere and Atmosphere (ISBA) land surface model (LSM) is used to produce land surface variables (LSVs) that are input to the DNN. The DNN...
journal article 2022
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Steele-Dunne, S.C. (author), Hahn, Sebastian (author), Wagner, Wolfgang (author), Vreugdenhil, M. (author)
The TU Wien Soil Moisture Retrieval (TUW SMR) approach is used to produce several operational soil moisture products from the Advanced Scatterometer (ASCAT) on the Metop series of satellites as part of the EUMETSAT Satellite Application Facility on Support to Operational Hydrology and Water Management (H SAF). The incidence angle dependence...
journal article 2021
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Davidse, Davy (author)
This thesis discusses the application of deep learning to Coherent Fourier<br/>Scatterometry data in order to quickly and reliably detect nanoparticles on<br/>surfaces. An introduction to deep learning is followed by a review of the<br/>experimental setup and used software. After that, results are presented of<br/>classification accuracy tests...
master thesis 2020
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Jooste, Nicael (author)
In this study, an unsupervised classification approach is used to investigate and characterize the spatial and temporal variability of MetOp-A ASCAT backscatter (σ◦) and the TUW SMR vegetation parameters across mainland France between 2007 and 2017. Currently, soil moisture data is retrieved from ASCAT backscatter measurements using the TU Wien...
master thesis 2020
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Šiaudinyte, L. (author), Pereira, S.F. (author)
As the semiconductor industry rapidly approaches the 3nm lithography node, on product overlay (OPO) requirements have become tighter and as a result, residuals magnitude requirements have become even more challenging. Metrology performance enhancements are required to meet these demands. Color Per Layer (CPL) is a unique imaging overlay...
conference paper 2020
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Kolenov, D. (author), Meng, P. (author), Pereira, S.F. (author)
We report a novel method of focus determination with high sensitivity and submicrometre accuracy. The technique relies on the asymmetry in the scattered far field from a nanosphere located at the surface of interest. The out-of-focus displacement of the probing beam manifests itself in imbalance of the signal of the differential detector...
journal article 2020
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Šiaudinyte, L. (author), Pereira, S.F. (author)
Optical inspection of periodic nanostructures is a major challenge in the semiconductor industry due to constantly decreasing critical dimensions. In this paper we combine coherent Fourier scatterometry (CFS) with a sectioning mask for subwavelength grating parameter determination. By selecting only the most sensitive regions of the scattered...
journal article 2020
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Cisotto, L. (author)
The electronic industry strives continuously to increase the performance of electronic components by adding new functionality, by making them more energy efficient or by increasing their absolute performance. This last possibility is mainly achieved by a higher density of electrical components. In a photo-lithographic process, this is associated...
doctoral thesis 2018
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Roy, S. (author)
Scattering is the process in which some form of radiation is deviated from its trajectory by a localized non-uniformity it encounters. These non-uniformities, called objects, can be of different material and geometry which determines among many things, mainly, the amount and direction of the scattered radiation. Scatterometry is the branch of...
doctoral thesis 2016
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