Far-field sectioning for the retrieval of subwavelength grating parameters using coherent Fourier scatterometry

Optical inspection of periodic nanostructures is a major challenge in the semiconductor industry due to constantly decreasing critical dimensions. In this paper we combine coherent Fourier scatterometry (CFS) with a sectioning mask for subwavelength grating parameter determination. By selecting only the most sensitive regions of the scattered...

Nanostep height measurement via spatial mode projection

We demonstrate an optical scheme for measuring the thickness of thin nanolayers with the use of light beam’s spatial modes. The novelty in our scheme is the projection of the beam reflected by the sample onto a properly tailored spatial mode. In the experiment described below, we are able to measure a step height smaller than 10 nm, i.e., one...