Electrostatic beam blankers are an alternative to photo-emission sources for generating pulsed electron beams for Time-resolved Cathodoluminescence and Ultrafast Electron Microscopy. While the properties of beam blankers have been extensively investigated in the past for applications in lithography, characteristics such as the influence of blanking on imaging resolution have not been fully addressed. We derive general analytical expressions for the spot displacement and loss in resolution induced by deflecting the electron beam in a blanker. In particular, we analyze the sensitivity of both measures to how precise the conjugate focus is aligned in between the deflector plates. We then work out the specific case of a beam blanker driven by a linear voltage ramp as was used in recent studies by others and by us. The result shows that the spot displacement and focus blur can be reduced to the same order as the electron beam probe size, even when using a beam blanker of millimeter or larger scale dimensions. An interesting result is that, by the right choice of the focus position in the deflector, either the spot displacement from the stationary position can be minimized, or the blur can be made zero but not both at the same time. Our results can be used both to characterize existing beam blanker setups and to design novel blankers. This can further develop the field of time-resolved electron microscopy by making it easier to generate pulses with a typical duration of tens of picoseconds in a regular scanning electron microscope at high spatial resolution.

Observing atomic motions as they occur is the dream goal of ultrafast electron microscopy (UEM). Great progress has been made so far thanks to the efforts of many scientists in developing the photoemission sources and beam blankers needed to create short pulses of electrons for the UEM experiments. While details on these setups have typically been reported, a systematic overview of methods used to obtain a pulsed beam and a comparison of relevant source parameters have not yet been conducted. In this report, we outline the basic requirements and parameters that are important for UEM. Different types of imaging modes in UEM are analyzed and summarized. After reviewing and analyzing the different kinds of photoemission sources and beam blankers that have been reported in the literature, we estimate the reduced brightness for all the photoemission sources reviewed and compare this to the brightness in the continuous and blanked beams. As for the problem of pulse broadening caused by the repulsive forces between electrons, four main methods available to mitigate the dispersion are summarized. We anticipate that the analysis and conclusions provided in this manuscript will be instructive for designing an UEM setup and could thus push the further development of UEM.