Sputter deposited Mg₂Fe_xSi_1-x films of 250 nm thickness have been investigated by means of Mössbauer spectroscopy. While non-hydrogenated films are characterized by a quadrupole split doublet, hydrogenated regions show a singlet with reduced isomer shift. The relative areas of the spectra reflect the relation between loaded and unloaded regions prepared at the same loading conditions.

Structural, defect and magnetic properties of the TiO₂:Co films are investigated. We varied the maximum Co⁺-implantation concentration from 0.5 at.% up to 5 at.%. A concentration window, which is considered as a threshold for the formation of metallic secondary phases is found. At this concentration it is also observed that the majority of the dopant atoms are incorporated into the host lattice.