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JJ Lee
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Approach to the characterization of through-oxide boron implantation by secondary ion mass spectrometry.
Journal article -
ZX Jiang
,
S Backer
,
JJ Lee
,
LY Wu
,
T Guenther
,
D Sieloff
,
P Choi
,
M Foisy
,
P.F.A. Alkemade