JL
J. Li
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As a component of lithography machine, the wafer table plays an important role during wafer
exposure. The surface flatness condition of the WT will cause focus and overlay errors during
exposure and directly affect wafer distortion levels. This project takes advantage of global genetic algorithm to successfully develop a routing optimization design tool in MATLAB to deliver an efficient routing for genetic wafer fingerprints. ...
exposure. The surface flatness condition of the WT will cause focus and overlay errors during
exposure and directly affect wafer distortion levels. This project takes advantage of global genetic algorithm to successfully develop a routing optimization design tool in MATLAB to deliver an efficient routing for genetic wafer fingerprints. ...
As a component of lithography machine, the wafer table plays an important role during wafer
exposure. The surface flatness condition of the WT will cause focus and overlay errors during
exposure and directly affect wafer distortion levels. This project takes advantage of global genetic algorithm to successfully develop a routing optimization design tool in MATLAB to deliver an efficient routing for genetic wafer fingerprints.
exposure. The surface flatness condition of the WT will cause focus and overlay errors during
exposure and directly affect wafer distortion levels. This project takes advantage of global genetic algorithm to successfully develop a routing optimization design tool in MATLAB to deliver an efficient routing for genetic wafer fingerprints.