PK
P. Kruit
3 records found
1
The manufacturer of an electron beam lithography machine pushes a better understanding and higher performance of the optical column to provide a better product with each iteration. At the heart of the column is the source of electrons: the gun lens. It holds the field emitter fro
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The Wien filter is an important part in the multi-beam inspection microscope that is being developed at the Imaging Physics research group at the TU Delft. The multi-beam inspection microscope uses an array of 20x20 parallel beams with a pitch of 1mmthat scan the sample simultane
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In this paper two ways of modeling the secondary electron yields of an insula-
tor under electron irradiation, are discussed and coupled. The drift-diusion-
reaction model is used to investigate the secondary yields and charging eects.
tor under electron irradiation, are discussed and coupled. The drift-diusion-
reaction model is used to investigate the secondary yields and charging eects.