Chemical vs. Physical factors in dry etching induced damage in the Si/GexSi1-x system
Journal Article
(1997)
Author(s)
RG van Veen (TU Delft - QN/Kavli Nanolab Delft)
MJ Teepen (External organisation)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
T Zijlstra (TU Delft - QN/Kavli Nanolab Delft)
K Werner (TU Delft - QN/Fysics of NanoElectronics)
A.H. Verbruggen (TU Delft - QN/Fysics of NanoElectronics)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:0010be7c-0d73-459a-8a8f-64c9c3a58cc1
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Publication Year
1997
Research Group
QN/Kavli Nanolab Delft
Volume number
35
Pages (from-to)
55-58
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