Chemical vs. Physical factors in dry etching induced damage in the Si/GexSi1-x system

Journal article (1997)

Authors

RG van Veen QN/Kavli Nanolab Delft - AS
MJ Teepen External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
T Zijlstra QN/Kavli Nanolab Delft - AS
K Werner QN/Fysics of NanoElectronics
A.H. Verbruggen QN/Fysics of NanoElectronics
S Radelaar OLD Metals Processing, Microstructures and Properties
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

1997

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft