Chemical vs. Physical factors in dry etching induced damage in the Si/GexSi1-x system

Journal Article (1997)
Author(s)

RG van Veen (TU Delft - QN/Kavli Nanolab Delft)

MJ Teepen (External organisation)

EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)

T Zijlstra (TU Delft - QN/Kavli Nanolab Delft)

K Werner (TU Delft - QN/Fysics of NanoElectronics)

A.H. Verbruggen (TU Delft - QN/Fysics of NanoElectronics)

S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)

Research Group
QN/Kavli Nanolab Delft
More Info
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Publication Year
1997
Research Group
QN/Kavli Nanolab Delft
Volume number
35
Pages (from-to)
55-58

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