Oxygen related defects in the top silicon layer of SIMOX; the effect of thermal treatments.
Journal Article
(2000)
Author(s)
A Rivera (TU Delft - Old - Section Defects in Materials)
JMM de Nijs (TU Delft - QN/Fysics of NanoElectronics)
P Balk (External organisation)
A van Veen (TU Delft - Old - sect Radiation Physics Group (TN/RF))
H. Schut (TU Delft - Old - Section Defects in Materials)
Paul F.A. Alkemade (TU Delft - Old - sect Electronic Materials (NS/EM))
Research Group
Old - Section Defects in Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:0701265d-dd5d-4ab7-aac3-b9b954839403
More Info
expand_more
expand_more
Publication Year
2000
Research Group
Old - Section Defects in Materials
Volume number
73
Pages (from-to)
77-81
No files available
Metadata only record. There are no files for this record.