Oxygen related defects in the top silicon layer of SIMOX; the effect of thermal treatments.

Journal Article (2000)
Author(s)

A Rivera (TU Delft - Old - Section Defects in Materials)

JMM de Nijs (TU Delft - QN/Fysics of NanoElectronics)

P Balk (External organisation)

A van Veen (TU Delft - Old - sect Radiation Physics Group (TN/RF))

H. Schut (TU Delft - Old - Section Defects in Materials)

Paul F.A. Alkemade (TU Delft - Old - sect Electronic Materials (NS/EM))

Research Group
Old - Section Defects in Materials
More Info
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Publication Year
2000
Research Group
Old - Section Defects in Materials
Volume number
73
Pages (from-to)
77-81

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