Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
Journal Article
(2008)
Author(s)
CF Carlstrom (External organisation)
R van der Heijden (External organisation)
MSP Andriesse (TU Delft - QN/Kavli Nanolab Delft)
F Karouta (External organisation)
RW van der Heijden (External organisation)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Huub Salemink (TU Delft - QN/Photronic Devices)
Research Group
QN/Kavli Nanolab Delft
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https://resolver.tudelft.nl/uuid:08e9f039-5b5a-45c4-b5a4-9ff30a0a294a
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Publication Year
2008
Research Group
QN/Kavli Nanolab Delft
Issue number
5
Volume number
26
Pages (from-to)
1675-1683
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