CV-doping profiling of shallow junctions with an abrupt and highly doped arsenic buried epilayer
Conference Paper
(2002)
Author(s)
C Ortiz (TU Delft - Electronic Components, Technology and Materials)
LK Nanver (TU Delft - Electronic Components, Technology and Materials)
WD van Noort (TU Delft - Electronic Components, Technology and Materials)
T.L.M. Scholtes (TU Delft - Electronic Components, Technology and Materials)
JW Slotboom (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
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https://resolver.tudelft.nl/uuid:2b6f0c83-7541-4f8d-8021-08dac4805f8d
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Publication Year
2002
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
75-80
ISBN (print)
90-73461-33-2
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