Investigation and characterization of silicon nitride thin films deposited by ECR-CVD plasma for Microelectromechanical systems application

Journal article (2007)

Authors

C Biasotto Microelectronics
JA Diniz External organisation
AM Daltrini External organisation
SA Moshkalyov External organisation
MJR Monteiro External organisation
Department
Microelectronics
Elektrotechniek Techniek
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Published Date

2007

Language

Undefined/Unknown

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Department

Microelectronics