Investigation and characterization of silicon nitride thin films deposited by ECR-CVD plasma for Microelectromechanical systems application
Journal Article
(2007)
Author(s)
C Biasotto (TU Delft - Microelectronics)
JA Diniz (External organisation)
AM Daltrini (External organisation)
SA Moshkalyov (External organisation)
MJR Monteiro (External organisation)
Department
Microelectronics
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Publication Year
2007
Department
Microelectronics
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