High aspect ratio spiral resonators for process variation investigation and MEMS applications
L.M. Middelburg (TU Delft - Electronic Components, Technology and Materials)
B. el Mansouri (TU Delft - Electronic Components, Technology and Materials)
H. van Zeijl (TU Delft - Electronic Components, Technology and Materials)
G. Zhang (TU Delft - Electronic Components, Technology and Materials)
R.H. Poelma (TU Delft - Electronic Components, Technology and Materials)
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Abstract
In this work a method is described to investigate process variations across a wafer. Through wafer MEMS spiral resonators were designed, simulated, fabricated and characterized by measuring the eigenfrequency and corresponding mode shapes. Measuring the eigenfrequency and resulting spectral behavior of resonators on different locations on the wafer was performed by using an optical measurement setup. Two laser beams were used where one is modulated by the periodic movement of the center mass of the resonator. One of the beams is reflected back from the modulated resonator and this beam hits a photo diode. Variations in light intensity due to movement of the resonator is providing a measurement signal correlated to movement. Preliminary measurements showed that measured eigenfrequencies are in correspondence with the simulations within a range of 0-10% deviation.